Oxford Instruments Deposition System
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Used for ion beam sputter deposition
Price varies per configuration. This Oxford Instruments system is dedicated to the production of multilayer dielectric coatings by means of ion beam sputter deposition. An ion source producing an elliptical beam 15 cm x 5 cm is directed at one of two targets on a double sided rotating holder. The sputtered flux is directed at a four fold planetary holder. A shutter is used to protect the samples during target pre cleaning. Thickness control is by means of a quartz crystal monitor with a dual sensor head and automatic switching.
The vacuum system utilizes two CTI 10 inch cryopumps and a backing pump.
The vacuum controller, Edwards 2042, operates the pumps and valves and also provides:
- Two Pirani gauges and one ion gauge
- Interlock system control
- Error checking of pumping sequences
- RS232 communications loop
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The system incorporates infrared substrate heating, gas flow controls, and chamber heating and cooling. Two doors are provided on the chamber.
All process functions are controlled by the PACS computer. The following units have reporting to PACS via the RS232 communication link:
- Edwards 2042 controller
- IL400 crystal monitor
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